オグラ　アツシ   Ogura Atusi   小椋　厚志    所属   明治大学  理工学部    職種   専任教授
言語種別	英語
発行・発表の年月	2003/09
形態種別	学術雑誌
標題	Evaluation of HfO2 film structures deposited by metal-organic chemical vapor deposition using Hf(N(C2H5)(2))(4)/O-2 gas system
掲載誌名	THIN SOLID FILMS
出版社・発行元	ELSEVIER SCIENCE SA
巻・号・頁	441(1-2),pp.161-164
著者・共著者	A Ogura, K Ito, Y Ohshita, M Ishikawa, H Machida
概要	We evaluated HfO2 films deposited by metal organic chemical vapor deposition using the Hf(N(C2H5)(2))(4)/O-2 gas system. The surface morphology and step coverage were simultaneously improved by increasing the deposition temperature. This improvement was achieved because the surface diffusion of reactants and/or their fragments was enhanced. At a low deposition temperature, N in Hf(N(C2H5)(2))(4) might disturb the surface diffusion of Hf, causing poor surface morphology and step coverage. (C) 2003 Elsevier B.V. All rights reserved.
DOI	10.1016/S0040-6090(03)00672-2
ISSN	0040-6090