オグラ　アツシ   Ogura Atusi   小椋　厚志    所属   明治大学  理工学部    職種   専任教授
言語種別	日本語
発行・発表の年月	1985
形態種別	国際会議議事録
査読	査読あり
標題	MINIMIZATION OF RESIDUAL STRESS IN SOI FILMS.
掲載誌名	Conference on Solid State Devices and Materials
巻・号・頁	10-11頁
著者・共著者	Atsushi Ogura, Koji Egami, Masakazu Kimura
概要	The extensive characterization of residual stress in SOI structure which consists of various types of interlying insulator and substrate materials produces an unacceptable residual stress in the structure. This stress can be reduced by the performance of underlayers (substrates, insulators) with slightly larger thermal expansion coefficients than that of Si.