Tsutsumi Toshiyuki
Department Undergraduate School , School of Science and Technology Position Professor |
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Language | English |
Publication Date | 1999/04 |
Type | Academic Journal |
Title | Fabrication of 40-150 nm Gate Length Ultrathin n-MOSFETs using Epitaxial Layer Transfer SOI Wafers |
Contribution Type | Co-authored (first author) |
Journal | The Japan Society of Applied Physics,Japanese Journal of Applied Physics |
Volume, Issue, Page | Vol.38 Part1 No.4B,pp.2492-2495 |
Author and coauthor | ◎Kenichi Ishii* , Eiichi Suzuki* , Sigo Kanamaru* , Tatsuro Maeda* , Toshiyuki Tsutsumi(助手) , Kiyoko Nagai* , Toshiro Sekkigawa* , Hiroshi Hiroshima* |