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YOKOGAWA RYO
Department Undergraduate School , School of Science and Technology Position Assistant Professor |
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| Language | English |
| Publication Date | 2017/10 |
| Type | Academic Journal |
| Peer Review | Peer reviewed |
| Title | Enhanced nickelidation rate in silicon nanowires with interfacial lattice disorder |
| Contribution Type | Co-authored (other than first author) |
| Journal | Journal of Applied Physics |
| Journal Type | Another Country |
| Volume, Issue, Page | 122(14),pp.144305-144305 |
| Author and coauthor | Shuichiro Hashimoto, Ryo Yokogawa, Shunsuke Oba, Shuhei Asada, Taiyu Xu, Motohiro Tomita, Atsushi Ogura, Takashi Matsukawa, Meishoku Masahara, and Takanobu Watanabe |