1. |
2019/10/29 |
Thermoelectric and photoelectric characteristics of graded films using Nb-doped SrTiO3 (The Pacific Rim Conference of Ceramic Societies 13)
|
2. |
2019/09/20 |
Effects of anode-side-CeO2 layer on characteristics of DC-EL device
|
3. |
2018/09/12 |
Electroluminescence from impact excitation and carrier injection process in a same devices (19th International Workshop on Inorganic and Organic Electroluminescence & 2018 International Conference on the Science & Technology of Emissive Display and Lighting (EL2018))
|
4. |
2017/01/26 |
DC Biased Inorganic Electroluminescent Devices Having Cu2O Semiconductor
|
5. |
2015/12/10 |
(The 22th International Display Workshops (IDW'15))
|
6. |
2014/03/19 |
Silicon wire waveguide based optical switching device employing IPS liquid crystal
|
7. |
2014/03/19 |
Vertical Light Coupling Between Silicon Vertically-Curved Waveguide and Optical Fiber
|
8. |
2014/03/17 |
(Annual Meeting of The Ceramic Society of Japan, 2014)
|
9. |
2014/01/24 |
Study of Carrier injection light-emitting devices using D-A Pair phosphor
|
10. |
2013/12/05 |
Electroluminescence from DC Biased ZnS:TbF3 Phosphor Layers Having Oxide Semiconductor (The 20th International Display Workshops (IDW'13))
|
11. |
2013/08/28 |
Vertically-Curved Silicon Waveguide Fabricated by Ion-Induced Bending Method for Vertical Light Coupling (The 10th International Conference on Group IV Photonics)
|
12. |
2013/07/30 |
The Present Status and Future Prospects of Display Research
|
13. |
2013/03/28 |
Epitaxial growth of ferromagnetic semiconductor Ga1-xMnxAs films on Ge(001) substrate (The 60th JSAP Spring Meeting, 2013)
|
14. |
2013/03/17 |
(Annual Meeting of Ceramic Society of Japan, 2013)
|
15. |
2012/12/07 |
Thin film perovskite electroluminescence with ferroelectric BaTiO3 films as insulating layers (The 19th International Display Workshops (IDW2012))
|
16. |
2012/11/19 |
Switching Loss Analysis of Commercial 200V class GaN-HEMT and Si-Superjunction MOSFET (21st Meeting on SiC and Related Wide Bandgap Semiconductors)
|
17. |
2012/11/08 |
Electroluminescence of BaSO4:Eu Thin-Film Phosphors (International Symposium on Rare Earths in 2012)
|
18. |
2012/11/08 |
Luminescence Properties of Perovskite Oxide Thin-Film Phosphors (International Symposium on Rare Earth in 2012)
|
19. |
2012/09/14 |
Ceramic EL device using Submicron Sized Oxide Phosphors
|
20. |
2011/12/19 |
Nonlinear Electrical Current Observed for Thin Films based on a Light-Emitting Perovskite-Type Oxide Pr0.002(Ca0.6Sr0.4)0.997TiO3 Directly Sandwiched by Electrodes (The 21st MRS-Japan ACademic Symposium)
|
21. |
2011/09/19 |
Nonlinear Electrical Properties of Thin Films ofa Light-Emitting Perovskite-Type Oxide Pr0.002(Ca0.6Sr0.4)0.997TiO3 (International Union of Materials Research Societies (IUMRS) International Conference Asia)
|
22. |
2011/03 |
Fabrication of Single-Mode Nonlinear Optical Waveguide Including Carbon Nanotube Using Channel-Pouring Method
|
23. |
2011/03 |
Theoretical study of GaN and SiC schottky barrier diode
|
24. |
2011/02/10 |
AC EL from ZnS:Mn Powder
|
25. |
2010/09/30 |
High luminance inorganic EL sheets basd on "peel-off" process (15th International workshop on inorganic and organic electroluminescence)
|
26. |
2010/09/15 |
Electroluminescence from SrTiO3: Pr, Al epitaxial thin films
|
27. |
2010/03/17 |
BaAlF5:Eu Electroluminescent Devices Prepared by Two-targets Pulsed-Electron-Beam Evaporation
|
28. |
2010/01/28 |
BaAL2S4:Eu EL Devices Prepared by DC-Reactive-Sputtering
|
29. |
2010/01/28 |
Si doped AlN:Eu Thin-Film EL Devices Prepared by Sputtering Methoed
|
30. |
2010/01/19 |
Continual Challenge in The Development of Inorganic Phosphor based EL Devices (International Workshop on Field Emitter and Semiconductor Materials and Devices)
|
31. |
2009/12/10 |
Low-Electric-Field-Driving Electroluminescence in ((Ca0.6Sr0.4)0.997Pr0.002)Ti3 and SrTiO3 perovskite Films (The 16th International Display Workshops (IDW' 09))
|
32. |
2009/11/05 |
Continual Challenge in The Development of Electroluminescent Devices (International Symposium for Phosphor Materials 2009 in Niigata (The Phosphor Safari))
|
33. |
2009/10/09 |
Improvement of the Phosphor Performance for BaAl2S4:Eu Blue-emitting Thin-films with Fluoride Compounds (The 11th Asian Symposium on Information Display (ASID’09))
|
34. |
2009/09/10 |
BaAl2S4:Eu electroluminescence devices prepared by DC reactive sputtering
|
35. |
2009/09/10 |
Electroluminescence in perovskite oxide (Ca0.6Sr0.4)TiO3:Pr thin films with BeTiO3 insulatino layers
|
36. |
2009/09/10 |
Photoluminescence properties of β-FeSi2 thin-film orepared by pulsed laser deposition
|
37. |
2009/09/10 |
Preparation of thick-film dielectric sheets for EL devices
|
38. |
2009/09/10 |
Study of BaAl2S4:Eu EL devices Using Thick-Dielectric Film
|
39. |
2009/06 |
Perceptibility of environmental sounds by earphone wearers listening to pop and rock music
|
40. |
2009/03/31 |
Electroluminescence in perovskite oxide (Ca0.6Sr0.4)TiO3:Pr thin films
|
41. |
2009/01/29 |
Study of BaAl2S4:Eu EL Devices Using Thick Dielectric Film
|
42. |
2008/12/18 |
Inorganic Electroluminescence from ZnS Based Phosphors
|
43. |
2008/12/04 |
High-Luminance from Localized Emission Center Phosphor in Powder-Type EL Device (The 15th International Display Workshops)
|
44. |
2008/09/11 |
New Trial of Inorganic EL Devices (14th International Workshop on Inorganic and Organic Electrolumienescence & 2008 International Conference on the Science and Technology of Emissive Displays and Lightings)
|
45. |
2008/09/09 |
Fluorine Effects on BaAl2S4:Eu Blue-Emitting Phosphors (14th International Workshop on Inorganic and Organic Electrolumienescence & 2008 International Conference on the Science and Technology of Emissive Displays and Lightings)
|
46. |
2008/01 |
Local Structure around Ba2+ and Eu2+ Ions in Blue Luminescent BaAl2S4:Eu Thin Films
|
47. |
2008/01 |
Luminescence GdF3 co-doped BaAl2S4:Eu blue-emitting phosphors
|
48. |
2007/11 |
Inorganic EL phosphors based on ZnS doped with some elements
|
49. |
2007/09 |
Characterization of β-FeSi2/Si hetero-junction diodes prepared with laser-ablated Fe films.
|
50. |
2007/09 |
Discussion on high-luminance ZnS Phosphor for electroluminescent devices
|
51. |
2007/09 |
Effects on AlF3-doping during the deposition of BaAl2S4:Eu thin-film phosphors
|
52. |
2007/09 |
Effects on GdF3 co-doping for BaAl2S4:Eu blue-emitting phosphors
|
53. |
2007/09 |
Electroluminescence from ZnS D-A Pair Type Phosphors Doped with Ⅲ-V Compounds (3)
|
54. |
2007/09 |
Local structure of Ba and doped Eu in Inorganic Electroluminescent Thin Film BaAl2S4:Eu studied by XAFS
|
55. |
2007/09 |
Optical Properties of Au-doped V2O5 Thin Films Prepared by Reactive Sputtering
|
56. |
2007/09 |
Optical Properties of Molybdenum Oxide Thin Films Prepared by Reactive Sputtering
|
57. |
2007/09 |
Preparation of Platinum and Palladium Composite Oxide Thin Films Deposited by Reactive Sputtering
|
58. |
2007/09 |
Substrate Temperature Dependence of Bi2O3-TiO2 Thin Films Prepared by RF Sputtering Method
|
59. |
2007/07 |
High Luminance Phosphors for Electroluminescent Devices
|
60. |
2007/05 |
Flux Effects on BaAl2S3:Eu,F Blue-Phosphors
|
61. |
2007/03 |
Electroluminescence from ZnS D-A Pair Type Phosphors Doped with III-V Compounds (2)
|
62. |
2007/03 |
RT CNT Single Electron Transistor Formed by RF Plasma
|
63. |
2007/03 |
Ternary Compound Phosphors for Electroluminescent Displays
|
64. |
2007/02 |
Present Status of Distributed and Thin-Film Inorganicc EL
|
65. |
2007/01 |
Luminescent Properties of ZnS Doped with Ⅲ-Ⅴ Semiconductors
|
66. |
2007/01 |
Optical Properties of Electron-Beam-Evaporated BaAl2S4:Eu Thin-films
|
67. |
2006/09 |
Effects of V2O5 interlayer on ZnS:Mn-ACTFEL Devices
|
68. |
2006/09 |
Phosphor Studies for Color EL Devices
|
69. |
2006/08 |
Electroluminescence from ZnS D-A Pair Type Phosphors Doped with III-V Compounds
|
70. |
2006/08 |
Red-Emitting CuAl2S4:Mn Thin-Films for Electroluminescent Devices
|
71. |
2006/05 |
Capacitance Temperature Sensor Made of Ferroelectric (Sr1-xCax)TiO3 for Cryogenic Temperatures
|
72. |
2006/03 |
Thermal-Diffusion of The Atoms in Laser-Abrated B-FeSi2 Thin-Films
|
73. |
2005/11 |
Full Color Inorganic Electroluminescent Devices
|
74. |
2005/03 |
BaAl2S4:Eu Thin Films Prepared by Sputtering
|
75. |
2005/03 |
Optical and Electrical Properties of Bi2O3-TiO2 Thin Films Deposited by Sputtering.
|
76. |
2005/03 |
Optical and Electrical Properties of Y Oxide Thin Films deposited by Reactive Sputtering
|
77. |
2005/03 |
Optical Properties and Annalysis of Electronic Structure of W Oxide Thin Films Doped with Nitrogen Deposited by Reactive Sputtering
|
78. |
2005/01 |
BaAl2S4:Eu thin-films prepared by rf Sputtering
|
79. |
2005/01 |
Thin-Film Electroluminescent Devices Prepared by Laser Annealing Method
|
80. |
2005/01 |
White emitting TFEL devices using hypercomplex sulfide phosphors
|
81. |
2004/09 |
Annealing Study for Color EL devices
|
82. |
2004/09 |
Optical properties and electronic structures analysis of impurity-doped oxide thin films
|
83. |
2004/09 |
Optical properties of impurity-doped Pd oxide thin-films deposited by reactive sputtering
|
84. |
2004/07 |
SID'04 報告会 -Emissive Display<Inorganic EL, Phosphors>ー
|
85. |
2004/05 |
Color Phosphors for Inorganic Electroluminescent Devices
|
86. |
2004/03 |
ZnGa2S4:Mn thin-film electroluminescent devices fabricated by magnetron sputtering
|
87. |
2003/12 |
Electrical Properties of β-FeSi2/Si Hetero-Diode Improved by Pulsed Laser Annealing
|
88. |
2003/10 |
Photoluminescence from β-FeSi2 Thin Film Grown by a Pulsed Laser Deposition Method.
|
89. |
2003/09 |
Laser annealed barium titanate thin films prepared by sol-gel processing
|
90. |
2003/09 |
Red emitting inorganic electroluminescent devices including color-changing-mediums technique
|
91. |
2003/09 |
Red emitting ZnGa2S4:Mn thin-film EL devices
|
92. |
2003/08 |
Optical and electric properties of Cr oxide thin films doped with Zr deposited by reactive sputtering
|
93. |
2003/08 |
optical properties and electronic structures analysis of impurity-doped W oxide thin films
|
94. |
2003/08 |
Optical properties of Pd oxide thin films deposited by reactive sputtering
|
95. |
2003/08 |
Optical properties of Zr-Mn oxide thin films
|
96. |
2003/03 |
A pulsed laser ablation method grown β-FeSi2 thin-films using buffer layer
|
97. |
2003/03 |
Energy dependence of spatial distribution in STJ X-ray detector
|
98. |
2003/03 |
Fabrication of superconducting tunnel junction X-ray detectors by full dry process
|
99. |
2003/03 |
High color purity green electroluminescent devices using CaAl2S4:Eu
|
100. |
2003/03 |
Improvement of crystalinity and electrical characteristics for excimer-laser annealed β-phase iron disilicide
|
101. |
2003/03 |
Optical properties of W oxide thin films doped with V deposited by reactive sputtering
|
102. |
2003/01 |
Characteristics of A-(Mg,Zn)-S (A=Ca,Sr,Ba) for EL phosphor
|
103. |
2003/01 |
High color purity green electroluminescent devices used Eu2+ doped CaAl2S4
|
104. |
2003/01 |
Mn2+ doped (Zn,Mg)Al2S4 electroluminescent phosphor
|
105. |
2002/12 |
11th international workshop on electroluminescence and 2002 international conference on the science and technology of emission displays and lightings -Inorganic Electroluminescence-
|
106. |
2002/12 |
Composition of β-FeSi2 thin-films grown by a pulsed laser deposition method
|
107. |
2002/12 |
New II-Y2-S4 phosphors for electroluminescent devices
|
108. |
2002/09 |
Electrical structures analysis of impurity-doped Mo oxide thin films
|
109. |
2002/09 |
Fabrication of superconducting tunnel junctions with lift-off technique
|
110. |
2002/09 |
Improvement of β-FeSi2 crystalline preparing a pulsed laser abration method by using the long-time and high temperature annealing
|
111. |
2002/09 |
Mn2+ and Eu2+ doped barium zinc sulfide phosphors
|
112. |
2002/09 |
Optical properties of nickel-titanium oxide thin films deposited by sputtering
|
113. |
2002/09 |
Optical properties of W-Nb oxide thin films deposited by reactive sputtering
|
114. |
2002/09 |
Possibiity of RGB emission by Eu2+ ion doped IIa-IIIb2S4 phosphors for full color inorganic electroluminescent displays
|
115. |
2002/09 |
Water quantitative analysis of blue-emitting BaAl2S4:Eu thin-films
|
116. |
2002/07 |
Mn2+ and Eu2; doped barium zinc sulfide phosphors
|
117. |
2002/07 |
Possibility of fuRGB Emission by Eu2+ ion doped IIa-IIIb2-S4 phosphors for full color electroluminescent displays
|
118. |
2002/06 |
Recent status and prospects of inorganic EL phosphors
|
119. |
2002/03 |
BaAl2S4:Eu thin films deposited by laser ablation
|
120. |
2002/03 |
Distribution properties of refractive index of zirconium oxide thin films deposited by sputtering
|
121. |
2002/03 |
Electronic structure of Molybdenum oxide films calculated by DV-Xα method
|
122. |
2002/03 |
Green emitting CaAl2S4:Eu thin-film EL devices
|
123. |
2002/03 |
Study of blue-emitting BaAl2S4:Eu Thin-Film by thermal desorption spectroscopy
|
124. |
2002/03 |
Surface segregation of β-FeSi2/Si prepared by a pulsed laser ablation method
|
125. |
2002/03 |
Zn-doping effect on CaIn2S4:Eu phosphors
|
126. |
2002/01 |
Annealig process of blue-emitting BaAl2S4:Eu thin-films
|
127. |
2002/01 |
BaAl2S4:Eu thin-films prepared by laser ablation technique
|
128. |
2002/01 |
BaMgAl10O17:Eu thin-films prepared by laser ablation
|
129. |
2001/12 |
Ternary & multinary sulfide phosphors for electroluminescence
|
130. |
2001/11 |
BaAl2S4:Eu Phosphors for Full-Color EL Display
|
131. |
2001/11 |
Polymer one-dimentional photonic crystal by physical vapor deposition
|
132. |
2001/11 |
Preparation of Efficient Blue Emitting BaAl2S4:Eu Thin Films without High Temperature Annealing
|
133. |
2001/09 |
Analysis on annealing process of blue-emitting BaAl2S4:Eu thin-film by thermal desorption spectroscopy
|
134. |
2001/09 |
BaMgA110017:Eu thin-films prepared by PLD method
|
135. |
2001/09 |
Blue-emitting BaAl2S4:Eu thin-films prepared by anealingless process
|
136. |
2001/09 |
Electrical and optical properties of nickel oxide thin-films deposited by reactive sputtering
|
137. |
2001/09 |
Electrical characteristics of AlN TFEL devices
|
138. |
2001/09 |
Laser-ablated β-FeSi2/Si hetero diode
|
139. |
2001/09 |
Optical and electrical properties of V oxide thin films doped with Zr deposited by reactive sputtering
|
140. |
2001/09 |
Optical properties of Mo oxide films doped with V deposited by reactive sputtering
|
141. |
2001/03 |
Effects of Ti in ZrO2, Nb2O5 Thin Films Deposited by Reactive Sputtering
|
142. |
2001/03 |
Electrical properties of β-FeSi2/Si hetero diode prepared by a pulsed laser ablation method
|
143. |
2001/03 |
Optical Properties for Sputtered Ti Doped Hf Oxide Thin-Films(Ⅲ)
|
144. |
2001/03 |
Optical Properties of Hf Doped V Oxide Thin Films Deposited by Reactive Sputtering(Ⅱ)
|
145. |
2001/03 |
Optical Properties of Mo Oxide Films Deposited by Reactive Sputtering
|
146. |
2001/03 |
Photoluminescence Properties of BaAl2S4: Eu Crystals
|
147. |
2001/01 |
BaAl2S4: Eu Thin Film Electroluminescent Devices Prepared by Conventional Beam Euaporation Method
|
148. |
2001/01 |
Electrical Characteristics of BaAl2S4: Eu EL Devices
|
149. |
2001/01 |
White Emitting undoped Organic Electroluminescent Devices used Super-Thin-Film Layer
|
150. |
2000/12 |
Blue-Emitting BaAl2S4: Eu2+ Thin-Film EL Devices
|
151. |
2000/12 |
Composition and Luminescene Properties of Blue-Emitting BaAl2S4:Eu Thin-Films
|
152. |
2000/12 |
Crystallization of Thin-Film Phosphors by New Annealing Technique
|
153. |
2000/11 |
BaAl2S4:Eu Thin-Film EL Devices Prepared by Pulsed Laser Ablation Technique
|
154. |
2000/11 |
β-FeSi2 thin-films grown by a pulsed laser Deposition method
|
155. |
2000/09 |
BaAl2S4: Eu Thin-Film EL Devices Prepared by Pulsed Laser Ablation Technique
|
156. |
2000/09 |
Composition Dependence of Bandgap energy in β-FeSi2 thin-films prepared by laser-ablation method
|
157. |
2000/09 |
Deposition of BaAl2S4:Eu Phosphor Thin Films by Conventional EB Evaporation
|
158. |
2000/09 |
Effects of Ti in Zro2 Thin Films Deposited by Reactive Sputtering
|
159. |
2000/09 |
Growth mechanism of β-FeSi2 thin-films prepared by pulse-laser-ablation method
|
160. |
2000/09 |
New High-Luminance blue-emitting TFEL devices(Ⅲ)
|
161. |
2000/09 |
Optical Properties for Sputtered Ti Doped Hf Oxide Thin-Films(II)
|
162. |
2000/09 |
Optical Properties of Hf Doped V Oxide Thin Films Deposited by Reactive Sputtering
|
163. |
2000/09 |
Theoritical calculation of Refractive indices for hybrid oxide thin films
|
164. |
2000/08 |
β-FeSi2 thin-films grown by a pulsed laser ablation method
|
165. |
2000/05 |
Composition and Optical Properties of Blue-Emitting BaAl2S4:Eu2+ Electroluminescent Thin Films
|
166. |
2000/03 |
AlN thin-film EL devices with SrTiO3 insulator
|
167. |
2000/03 |
An XPS study of BaAl2S4:Eu thin films prepared by switching electron-beam evaporation with two targets
|
168. |
2000/03 |
Effects of buffer layer doped with impurities on electroluminescence II
|
169. |
2000/03 |
Effects of Ti in Nb25 films deposited by reactive sputtering
|
170. |
2000/03 |
New high luminance blue-emitting TFEL devices (II)
|
171. |
2000/03 |
Optical properties for sputterd Ti doped Hf oxide thin-films
|
172. |
2000/03 |
Optical properties of BaAl2S4:Eu thin-films prepared by switching electrom-beam evaporation with two targets
|
173. |
2000/03 |
PrxSr1 -xTiO3 thin-film EL devices
|
174. |
2000/03 |
β-FeSi2 thin-films grown by laser ablation method
|
175. |
2000/02 |
Report on 5th international display phosphor conference -Inorganic-
|
176. |
2000/01 |
Effects of buffer layer for TFEL devices
|
177. |
2000/01 |
Eu2+ doped BaAl2S4 blue emitting thin-film EL devices
|
178. |
1999/12 |
Blue Emitting BaAl2S4:Eu TFEL Devices Prepared by Two Targets Pulse Electron Beam Evaporation
|
179. |
1999/12 |
Blue-emitting BaAl2S4:Eu2+ thin-film electroluminescent devices
|
180. |
1999/11 |
CaIII2S4:Ce Electroluminescent Devices Prepared by Pulse Deposition Technique
|
181. |
1999/11 |
Electroluminescence of BaAl2S4:Eu phosphor thin-films
|
182. |
1999/09 |
AlN thin film EL devices doped with rare-earth
|
183. |
1999/09 |
Effects of buffer layer doped with impurities on electroluminescence
|
184. |
1999/09 |
New high brightness blue-emitting TFEL devices
|
185. |
1999/09 |
Optical properties for reactive sputtered Ta25:Ti films
|
186. |
1999/09 |
PrxSr1 -xTiO3 thin film EL devices deposited by RF magnetron sputtering
|
187. |
1999/09 |
SrF2 thin film electroluminescence devices
|
188. |
1999/01 |
CaAl2S4:Ce thin-film EL devices prepared by two targets pulse electron-beam evaporation
|
189. |
1999/01 |
Efficient blue-emitting CaGa2S4:Ce thin-film electroluminescent devices prepared by two targets pulse electron beam evaporation method
|
190. |
1998/09 |
CaAl2xGa2(1-x)S4:Ce thin-film EL devices prepared by two point EB evaporation method
|
191. |
1998/09 |
CaF2:Eu 薄膜EL素子
|
192. |
1998/09 |
Thin-film EL devices of PrxSr1-xTiO3
|
193. |
1998/03 |
CaAl2S4S4:Ce thin-film EL devices prepared by two point EB evaporation method
|
194. |
1998/03 |
Electroluminescence of Al1-xGaxN thin-films doped with rare-earth ions
|
195. |
1998/03 |
Optical properties of Hf1+xTi1-xO4 films prepared by He gas mixed RF magnetron sputtering (II)
|
196. |
1998/03 |
Optical properties of Ta2O5:Ti films deposited by sputtering (II)
|
197. |
1997/11 |
CaGa2S4:Ce Electroluminescent Devices Prepared by The Two Target Electron-Beam Evaporation
|
198. |
1997/10 |
CaGa2S4:Ce thin-film EL devices prepared by two point EB evaporation method
|
199. |
1997/10 |
Electroluminescence of AlN thin-films doped with rare-earth ions
|
200. |
1997/10 |
Irradiation He-Cd laser on Zn1-xMgxS thin-film EL devices
|
201. |
1997/10 |
Optical properties of Hf1+xTi1-xO4 films prepared by He gas mixed RF magnetron sputtering
|
202. |
1997/10 |
Optical properties of Nb25:Ti films deposited by sputtering
|
203. |
1997/10 |
Thin-film EL devices of ITO:Ln
|
204. |
1997/03 |
Effects of He gas during sputtering for Hf1+xTi1-xO4 thin-films.
|
205. |
1997/03 |
Optical properties for Ta2O5:Ti sputterd thin-films
|
206. |
1997/03 |
Zn1-xMgxF2 thin-film EL devices
|
207. |
1996/09 |
Effects of He gas on deposition of sputtered ITO thin-films
|
208. |
1996/09 |
Infrared emission of ZnS thin films doped with rare-earth ions
|
209. |
1996/09 |
Optical properties of Hf1+xTi1-xO4 films by RF sputtering
|
210. |
1996/08 |
Electroluminescent Spectra for Tb3+ Doped Zn1-xCdxS Thin-Films
|
211. |
1996/03 |
Preparation of Zr1+xTi1-xO4 films by RF co-sputtering
|
212. |
1996/03 |
Relaxation for Tb3+ ion in Zn1-xCdxS:TbOF thin film EL devices
|
213. |
1996/03 |
ZnO-In2O3 thin-films prepared by magnetron sputtering
|
214. |
1995/11 |
Several Trial for New Phosphors of Electroluminescent Devices
|
215. |
1995/08 |
Zn1-xMgxS:Eu thin-film EL devices
|
216. |
1995/03 |
Applicattion of the IIb-III2-VI4 compounds for thin-film electroluminescent devices
|
217. |
1995/03 |
Photoluminescence for SrCa1-y-xBaxF2:Eu single crystals
|
218. |
1995/03 |
Temperature dependence of CdF2 thin-film electroluminescent devices (II)
|
219. |
1995/03 |
Thin-film electroluminescent devices having Ln2O2S host
|
220. |
1994/10 |
Electroluminiscent Devices of Electron-Beam-Evaporated II-III2-VI4 Hosts
|
221. |
1994/09 |
Application of the IIb-IIIb2VI4 compounds for thin-film electroluminescent devices
|
222. |
1994/03 |
5D3->5D4 relaxation for Tb3+ ion in ZnxCd(1-x)S:Tb3+ EL devices
|
223. |
1994/03 |
Eu concentration dependence of evcitation and emission spectra in BaF2:Eu single crystals
|
224. |
1994/01 |
Thin-film electroluminescent devices doped with Tm3+ ion
|
225. |
1993/12 |
Blue-emitting CaGa2S4:Ce thin-film electroluminescent devices
|
226. |
1993/09 |
Blue-emitting La2O2S:Tm thin-film electroluminescent devices
|
227. |
1993/09 |
Blue-emitting thin film electroluminescent devices of CaF2:Eu and CaGa2S4:Ce
|
228. |
1993/09 |
Electroluminescent spectra for ZnS(1-x)Sex:Tm3+ thin-film EL devices
|
229. |
1993/09 |
Temperature dependence of CdF2 thin-film electroluminescent devices
|
230. |
1993/08 |
Electroluminescence spectra for rare-Doped Zn1-xCdxS thin films
|
231. |
1993/08 |
Electroluminescence spectra for rare-Doped ZnS1-xSex thin films
|
232. |
1993/05 |
Rare Earth Doped Thin Film Electroluminescent Devices Using the Fluoride Emitting Layer
|
233. |
1993/01 |
Thin-film electroluminescent devices using the fluoride emitting layers
|
234. |
1992/12 |
Thin-film electroluminescence of several compounds doped with Tm3+ ion
|
235. |
1992/09 |
Band-gap energy dependence of host materials for electroluminescent spectra
|
236. |
1992/09 |
Thin-film electroluminescent devices having CdF2 host
|
237. |
1992/09 |
Time resolved emission spectra for ZnS:Tm3+ thin film EL devices
|
238. |
1992/05 |
Band-Gap Energy Dependence of Host Materials for Electroluminescent Spectra
|
239. |
1992/01 |
Band-gap energy dependence for the EL spectra in Tm ion doped thin-films
|
240. |
1991/11 |
ZnF2 thin-film electroluminescent devices doped with rare-earth ions
|
241. |
1991/10 |
Blue-emitting CaF2:Eu thin-film electroluminescent devices
|
242. |
1991/10 |
Blue-emitting thin-film electroluminescence of several host materials doped with Tm3+ ion
|
243. |
1991/10 |
Dependence of applied pulse width for emission intensity in ZnS:Er,YbFx thin-film EL devices
|
244. |
1991/10 |
Effects of UV light irradiation on ZnS:TbFx thin-film EL devices (II)
|
245. |
1991/10 |
ZnF2 thin-film electroluminescent devices doped with rare-earths
|
246. |
1991/09 |
Effect of UV light irradiation on ZnS thin-film electroluminescent films
|
247. |
1991/03 |
Effects of UV light irradiation on ZnS:TbFx thin-film EL devices
|
248. |
1991/03 |
Electroluminescence in ZnS:Tm3+ thin-films
|
249. |
1990/09 |
Electroluminescence in Y2O2S:Eu thin-films
|
250. |
1990/09 |
Transient behavior in ZnS:Mn and ZnS:Tb thin-films
|
251. |
1990/06 |
Transient Behavior of Photoluminescence and Electroluminescence in ZnS Thin Film Doped with Tb3+ Ion
|
252. |
1990/03 |
Photoluminescence of ZnS:TbFx Thin-films
|
253. |
1990/03 |
Time resolved emission spectra for SrS:Ce thin-film electroluminescent devices
|
254. |
1989/10 |
Transient Characteristics of Emission in ZnS:Mn Thin Film Electroluminescent Devices
|
255. |
1989/09 |
Transient characteristics in ZnS:TbFx thin-film electroluminescent devices
|
256. |
1989/04 |
Time responses of ZnS:TbFx thin-film electroluminescent devices at different heattreatment temperature
|
257. |
1988/10 |
Heattreatment temperature dependence of emission layer in time-resolved emission spectra of ZnS:TbFx thin film electroluminescent devices
|
258. |
1988/10 |
Red emitting electroluminescence in ZnS:EuFx thin-film coactivated by Li+1 ion
|
259. |
1988/10 |
Time Resolved Emission Spectra in ZnS thin-film Electroluminescent Devices
|
260. |
1988/03 |
Transient characteristics of emission in ZnS:TbF3 TFEL devices (III)
|
261. |
1987/10 |
Transient characteristics of emission in ZnS:TbF3 TFEL devices (II)
|
Display 5 items
|
Display all(261)
|